Overlay-shift measurement system and method for manufacturing semiconductor structure and measuring alignment mark of semiconductor structure

ABSTRACT

Methods for manufacturing a semiconductor structure are provided. A substrate is provided. A first lithography is performed according to a first layer mask, to form a plurality of first photonic crystals with a first pitch on a first area of a layer above the substrate. A second lithography is performed according to a second layer mask, to form a plurality of second photonic crystals with a second pitch on a second area of the layer. A light is provided to illuminate the first and second photonic crystals. Light reflected by the first and second photonic crystals or transmitted through the first and second photonic crystals is received. The received light is analyzed to detect overlay-shift between the first photonic crystals corresponding to the first layer mask and the second photonic crystals corresponding to the second layer mask.

CROSS REFERENCE TO RELATED APPLICATIONS

This Application claims priority of U.S. Provisional Application No.62/584,995, filed on Nov. 13, 2017, the entirety of which isincorporated by reference herein.

BACKGROUND

Generally, a semiconductor integrated circuit (IC) is formed on multiplelayers of a semiconductor substrate (or a semiconductor wafer). In orderto properly fabricate a semiconductor integrated circuit, some layers ofthe substrate need to be aligned with each other. In such cases, ametrology target (or alignment mark) formed in a semiconductor substrateis utilized to perform the overlay (or alignment) measurements.

The traditional metrology target may include a plurality of gratings,and an overlay shift between different layers of the semiconductorsubstrate can be measured based on the arrangement of the gratings.

Although existing metrology targets have generally been adequate fortheir intended purposes, they have not been entirely satisfactory in allrespects. Consequently, there is a need for new metrology target thatprovides a solution for the overlay-shift measurement, criticaldimensions (CD), and depth-of-focus (DoF).

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It shouldbe noted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1 shows a block diagram illustrating a schematic diagram of anoverlay-shift measurement system, in accordance with some embodiments ofthe disclosure.

FIG. 2 shows a top view of a metrology target, in accordance with someembodiments of the disclosure.

FIG. 3A shows a sectional view of the metrology target of FIG. 2 alongthe line A-AA, in accordance with some embodiments of the disclosure.

FIG. 3B shows a stereoscopic view of the metrology target of FIG. 2, inaccordance with some embodiments of the disclosure.

FIG. 4 shows a schematic illustrating the input light LI, the reflectedlight LR, and the transmitted light LT of the metrology target of FIG.2, in accordance with some embodiments of the disclosure.

FIG. 5A shows an optical spectrum of the input light LI of FIG. 4.

FIG. 5B shows an optical spectrum of the reflected light LR of FIG. 4.

FIG. 5C shows an optical spectrum of the transmitted light LT of FIG. 4.

FIGS. 6A-6G show cross-sectional representations of various stages offorming the metrology target of FIG. 3A, in accordance with someembodiments of the disclosure.

FIGS. 7A-7E show cross-sectional representations of various stages offorming the metrology target of FIG. 3A, in accordance with someembodiments of the disclosure.

FIG. 8A shows a schematic illustrating the input light LI, the reflectedlight LR, and the transmitted light LT of a metrology target withoverlay-shift.

FIG. 8B shows an optical spectrum of the reflected light LR of FIG. 8A.

FIG. 8C shows an optical spectrum of the transmitted light LT of FIG.8A.

FIG. 9A shows a schematic illustrating the input light LI, the reflectedlight LR, and the transmitted light LT of a metrology target withoverlay-shift.

FIG. 9B shows an optical spectrum of the reflected light LR of FIG. 9A.

FIG. 9C shows an optical spectrum of the transmitted light LT of FIG.9A.

FIG. 10 shows a schematic illustrating the input light LI, and thetransmitted light LT of a metrology target with overlay-shift.

FIG. 11A shows an optical spectrum of a reflected light LR with adecreased center wavelength intensity.

FIG. 11B shows an optical spectrum of a reflected light LR with anincreased FWHM.

FIG. 11C shows an optical spectrum of a reflected light LR with multiplescattering wavelength.

FIGS. 12A-12G show top views of various metrology targets, in accordancewith some embodiments of the disclosure.

FIG. 13 shows a top view of a metrology target, in accordance with someembodiments of the disclosure.

FIG. 14 shows a top view of a metrology target, in accordance with someembodiments of the disclosure.

FIG. 15A shows a sectional view of a mixed metrology target, inaccordance with some embodiments of the disclosure.

FIG. 15B shows a sectional view of the mixed metrology target of FIG.15A along the line B-BB, in accordance with some embodiments of thedisclosure.

FIG. 15C shows a stereoscopic view of the mixed metrology target of FIG.15A, in accordance with some embodiments of the disclosure.

FIG. 15D shows the Bossung curves of the mixed metrology target of FIG.15A, in accordance with some embodiments of the disclosure.

FIG. 16A shows a sectional view of a mixed metrology target, inaccordance with some embodiments of the disclosure.

FIG. 16B illustrates the relationship between diffraction intensity (I)and DoF/CD of the mixed metrology target of FIG. 16A, in accordance withsome embodiments of the disclosure.

FIG. 17A illustrates the relationship between the differential ofdiffraction intensity (I) and CD (e.g., dI/dCD) of the metrology targetsof FIG. 16A, in accordance with some embodiments of the disclosure.

FIG. 17B illustrates the relationship between diffraction intensity (I)and CD of the mixed metrology target of FIG. 16A, in accordance withsome embodiments of the disclosure.

FIG. 18 shows a schematic illustrating a mixed metrology target, inaccordance with some embodiments of the disclosure.

FIG. 19 shows a schematic illustrating of a compound metrology target,in accordance with some embodiments of the disclosure.

FIG. 20A shows a stereoscopic view of a semiconductor structure withoutoverlay-shift, in accordance with some embodiments of the disclosure.

FIG. 20B shows a stereoscopic view of a semiconductor structure of FIG.20A with an overlay-shift in the fifth material layer L5.

FIG. 21 shows a method for measuring a metrology target of asemiconductor structure, in accordance with some embodiments of thedisclosure.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the subject matterprovided. Specific examples of components and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. In some embodiments, theformation of a first feature over or on a second feature in thedescription that follows may include embodiments in which the first andsecond features are formed in direct contact, and may also includeembodiments in which additional features may be formed between the firstand second features, such that the first and second features may not bein direct contact. In addition, the present disclosure may repeatreference numerals and/or letters in the various examples. Thisrepetition is for the purpose of simplicity and clarity and does not initself dictate a relationship between the various embodiments and/orconfigurations discussed.

Furthermore, spatially relative terms, such as “beneath,” “below,”“lower,” “above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

Some variations of the embodiments are described. Throughout the variousviews and illustrative embodiments, like reference numbers are used todesignate like elements. It should be understood that additionaloperations can be provided before, during, and/or after a disclosedmethod, and some of the operations described can be replaced oreliminated for other embodiments of the method.

FIG. 1 shows a block diagram illustrating a schematic diagram of anoverlay-shift measurement system 100, in accordance with someembodiments of the disclosure. The overlay-shift measurement system 100Aincludes a light source 101, an optical device 102, the light detectiondevices 105A and 105B, and a processor 106. The overlay-shiftmeasurement system 100 is capable of measuring a semiconductor structure103 on a stage 107. The semiconductor structure 103 includes a metrologytarget (or alignment mark) 104. In some embodiments, the semiconductorstructure 103 is a wafer or a chip.

In some embodiments, the overlay-shift measurement system 100 mayperform a diffraction-based overlay (DBO) measurement on the metrologytarget 104. For example, the light source 101 is configured to providelight to the optical device 102, and then the optical device 102 isconfigured to provide an input light LI to the metrology target 104. Insome embodiments, the input light LI is a pulsed or broadband light thathorizontally illuminates the metrology target 104, and the wavelength ofthe input light LI is about 13.5 nm to 1000 nm. In response to the inputlight LI illuminating the metrology target 104, the reflected light LRand/or the transmitted light LT are generated. The light detectiondevice 105A is configured to detect the transmitted light LT and thengenerates the data corresponding to the transmitted light LT (e.g., theimage data generated by the transmitted light LT). Similarly, the lightdetection device 105B is configured to detect the reflected light LR andthen generates the data corresponding to the reflected light LR (e.g.,the image data generated by the reflected light LR). In suchembodiments, the light detection device 105B is disposed on the sameside of the optical device 102, and the light detection device 105A isdisposed on an opposite side of the optical device 102. The processor106 is configured to receive the data from the light detection devices105A and 105B, and the data includes characteristics of the reflectedlight LR and the transmitted light LT. Subsequently, the processor 106analyzes the data to determine the overlay-shift (OVL) between multiplephotonic crystals formed in the metrology target 104. In someembodiments, the characteristics of the reflected light LR and thetransmitted light LT include information regarding center wavelengthshift, scattering wavelength count, scatter angle, center wavelengthintensity, full width at half maximum or photonic band gap. Detail ofthe characteristics of the reflected light LR and the transmitted lightLT are described below.

In some embodiments, the optical device 102 is disposed above themetrology target 104, and the optical device 102 is configured toprovide the input light LI to the metrology target 104 with an incidenceangle. Furthermore, the light detection devices 105A and 105B arearranged at the positions appropriate for receiving the reflected lightLR and/or the transmitted light LT according to the incidence angle.

In some embodiments, the metrology target 104 is positioned at the edgeof the wafer. In some embodiments, the metrology target 104 ispositioned in the test line of the wafer or chip.

FIG. 2 shows a top view of a metrology target 104 a, in accordance withsome embodiments of the disclosure. The metrology target 104 a is acluster-type photonic crystalline structure, and includes a firstpattern PAT1 and a second pattern PAT2. The first pattern PAT1 and thesecond pattern PAT2 are formed on a semiconductor structure 110. Thefirst pattern PAT1 is formed by multiple photonic crystals 210, and thephotonic crystals 210 are arranged in an array with the same pitch P.The second pattern PAT2 is formed by multiple photonic crystals 220, andthe photonic crystals 220 are arranged in an array with the same pitchP. Furthermore, the distances between the rightmost photonic crystal 210of the first pattern PAT1 and the leftmost photonic crystal 220 of thefirst pattern PAT2 are equal to the pitch P. In the metrology target 104a, the photonic crystals 210 and 220 have the same sectional shape andsame size. In such embodiments, the sectional shape of the photoniccrystals 210 and 220 is a point-symmetry shape. For example, eachsectional shape of the photonic crystals 210 and 220 is a circular shapewith a radius R. In some embodiments, the pitch P and the radius R areabout 10 nm to 10 μm.

In the metrology target 104 a, the photonic crystals 210 are formed by afirst layer mask corresponding to a first layer of the semiconductorstructure 103, and the photonic crystals 220 are formed by a secondlayer mask corresponding to a second layer of the semiconductorstructure 103. The first and second layer masks are used in successivepatterning steps, and the first layer mask is used in a previouspatterning step and the second layer mask is used in a subsequentpatterning step. Furthermore, the photonic crystals 210 and 220 arearranged in the same rows. For example, the centers of the third columnof photonic crystals 210 and 220 are positioned on the line A-AA.Furthermore, the distances between the rightmost photonic crystal 210 ofthe first pattern PAT1 and the leftmost photonic crystal 220 of thefirst pattern PAT2 are equal to the pitch P. Thus, no overlay-shift ispresent between the first and second layer masks in the metrology target104 a, i.e., the overlay-shift is equal to zero (e.g., OVL=0).

FIG. 3A shows a sectional view of the metrology target 104 a of FIG. 2along the line A-AA, in accordance with some embodiments of thedisclosure. The photonic crystals 210 and the photonic crystals 220 areformed in a target layer on the semiconductor structure 110. In someembodiments, multiple layers are arranged between the semiconductorstructure 110 and the metrology target 104 a.

FIG. 3B shows a stereoscopic view of the metrology target 104 a of FIG.2, in accordance with some embodiments of the disclosure. The photoniccrystals 210 and 220 are the circular pillars formed of the samematerial in the target layer. In some embodiments, the photonic crystals210 and 220 are formed by different materials in the target layer.Furthermore, the photonic crystals 210 and 220 form a photoniccrystalline structure. In order to simplify the description, thefeatures other than the photonic crystals 210 and 220 will be omittedfrom the target layer. Furthermore, the pillars of the photonic crystals210 are electrically insulated from each other, and the pillars of thephotonic crystals 210 also electrically insulated from the pillars thephotonic crystals 220.

Fabricating processes of photonic crystalline structures have developedin recent years due to nanotechnology developments. A photoniccrystalline structure is a special periodic array. When light raysincident into a photonic crystalline structure, a photonic band gapphenomenon occurs. Specifically, a photonic crystalline structure maytotally reflect light rays with a specific wavelength, and light rayswith other wavelengths may penetrate the photonic crystalline structure.The total-reflection wavelength is defined as a wavelength that occursdue to the photonic band gap phenomenon.

FIG. 4 shows a schematic illustrating the input light LI, the reflectedlight LR, and the transmitted light LT of the metrology target 104 a ofFIG. 2, in accordance with some embodiments of the disclosure. Asdescribed above, the input light LI is provided to the metrology target104 a by the optical device 102 of FIG. 1. The arrangement of the firstpattern PAT1 and the second pattern PAT2 can reflect the light with aspecific wavelength, and then the reflected light LR is obtained by thelight detection device 105B. Simultaneously, the light without thespecific wavelength can penetrate the first pattern PAT1 and the secondpattern PAT2, and then the transmitted light LT is obtained by the lightdetection device 105A.

FIG. 5A shows an optical spectrum of the input light LI of FIG. 4. InFIG. 5A, the input light LI has a center wavelength F0 with a full widthat half maximum (FWHM) FWHM_I. In such embodiments, FWHM_I representsthe width of a spectrum curve measured between those points on they-axis which are half the maximum amplitude Amp1 of the transmittedlight LT.

FIG. 5B shows an optical spectrum of the reflected light LR of FIG. 4.In some embodiments, the information regarding the optical spectrum ofthe reflected light LR is obtained by the light detection device 105B.In FIG. 5B, the reflected light LR has a center wavelength F0 with aFWHM FWHM_R. Specifically, light with the center wavelength F0 isreflected by the photonic crystals 210 and 220 of the metrology target104 a. Furthermore, the FWHM FWHM_R of the reflected light LR is smallerthan the FWHM FWHM_I of the input light LI. In such embodiments, FWHM_Rrepresents the width of a spectrum curve measured between those pointson the y-axis which are half the maximum amplitude Amp2 of the reflectedlight LR.

FIG. 5C shows an optical spectrum of the transmitted light LT of FIG. 4.In some embodiments, the information regarding the optical spectrum ofthe transmitted light LT is obtained by the light detection device 105A.In FIG. 5C, the transmitted light LT does not include the light with thecenter wavelength F0. Specifically, the light without the wavelength F0can penetrate the first pattern PAT1 and the second pattern PAT2 of themetrology target 104 a.

As described above, according to the data from the light detectiondevice 105A and/or the light detection device 105B, the processor 106can analyze the data to determine the overlay-shift between the photoniccrystals 210 of the first pattern PAT1 and the photonic crystals 220 ofthe second pattern PAT2.

FIGS. 6A-6G show cross-sectional representations of various stages offorming the metrology target 104 a of FIG. 3A, in accordance with someembodiments of the disclosure.

Referring to FIG. 6A, a substrate 110 is provided. The substrate 110 maybe made of silicon or other semiconductor materials. Alternatively oradditionally, the substrate 110 may include other elementarysemiconductor materials such as germanium. In some embodiments, thesubstrate 110 is made of a compound semiconductor such as siliconcarbide, gallium arsenic, indium arsenide, or indium phosphide. In someembodiments, the substrate 110 is made of an alloy semiconductor such assilicon germanium, silicon germanium carbide, gallium arsenic phosphide,or gallium indium phosphide. In some embodiments, the substrate 110includes an epitaxial layer. For example, the substrate 110 has anepitaxial layer overlying a bulk semiconductor.

The substrate 110 may include various doped regions such as p-type wellsor n-type wells). Doped regions may be doped with p-type dopants, suchas boron or BF₂, and/or n-type dopants, such as phosphorus (P) orarsenic (As). In some other embodiments, the doped regions may be formeddirectly on the substrate 110.

The substrate 110 also includes isolation structures (not shown). Theisolation structure is used to define and electrically isolate variousdevices formed in and/or over the substrate 110. In some embodiments,the isolation structure includes shallow trench isolation (STI)structure, local oxidation of silicon (LOCOS) structure, or anotherapplicable isolation structure. In some embodiments, the isolationstructure includes silicon oxide, silicon nitride, silicon oxynitride,fluoride-doped silicate glass (FSG), or another suitable material.

Afterwards, a material layer 112 is formed on the substrate 110, and amaterial layer 114 is formed on the material layer 112. The materiallayer 112 is designed to form the first pattern PAT1 and the secondpattern PAT2 of the metrology target 104 a. In some embodiments, thematerial layer 112 or 114 is a dielectric layer. In some embodiments,the material layer 112 or 114 is a metal layer. In order to form thespecific patterns, a first photolithography process is performed. Thefirst photolithography process includes photoresist coating (e.g.,spin-on coating), soft baking, layer mask aligning, exposure,post-exposure baking, developing the photoresist, rinsing, drying (e.g.,hard baking), or other suitable processes.

After forming the material layer 114, a photoresist layer 116 is formedon the material layer 114. In some embodiments, the photoresist layer116 is formed by depositing a polymer composition on the material layer114. In some embodiments, the photoresist layer 116 is a positivephotoresist. The positive photoresist is sensitized when exposed tolight so that exposed regions will dissolve in a developer solutionleaving behind unexposed regions.

In some embodiments, the material layer 112, the material layer 114 andthe photoresist layer 116 are independently formed by a depositionprocess, such as a spin-on coating process, chemical vapor depositionprocess (CVD), physical vapor deposition (PVD) process, and/or othersuitable deposition processes.

A first layer mask 170 is formed over the photoresist layer 116, and anexposure process 172 is performed on the photoresist layer 116. Forexample, the photoresist layer 116 is exposed to a radiation beamthrough the first layer mask 170. The first layer mask 170 includesblocking portions that do not allow the radiation beam to pass through.

Next, as shown in FIG. 6B, the pattern of the first layer mask 170 istransferred to the photoresist layer 116. Therefore, the photoresistlayer 116 is patterned, and the exposed regions of the photoresist layer116 are dissolved. Thus, the unexposed regions 116 a are formed on thematerial layer 114.

Afterwards, the material layer 114 is etched by an etching process 174as shown in FIG. 6C in accordance with some embodiments of thedisclosure. The material layer 114 is etched by using the photoresistlayer 116 as the first layer mask 170. In some embodiments, the etchingprocess is a dry etching process, such as a plasma etching process.

After the material layer 114 is etched, the unexposed region 116 a ofthe photoresist layer 116 is removed as shown in FIG. 6D in accordancewith some embodiments of the disclosure. Afterwards, a photoresist layer118 is formed on the material layer 112. In some embodiments, thephotoresist layer 118 is formed by depositing a polymer composition onthe material layer 112. In some embodiments, the photoresist layer 118is a positive photoresist. The positive photoresist is sensitized whenexposed to light so that exposed regions will dissolve in a developersolution leaving behind unexposed regions.

A second layer mask 180 is formed over the photoresist layer 118, and asecond photolithography process is performed. For example, an exposureprocess 176 is performed on the photoresist layer 118, and thephotoresist layer 118 is exposed to a radiation beam through the secondlayer mask 180. The second layer mask 180 includes blocking portionsthat do not allow the radiation beam to pass through.

Next, as shown in FIG. 6E, the pattern of the second layer mask 180 istransferred to the photoresist layer 118. Therefore, the photoresistlayer 118 is patterned, and the exposed regions of the photoresist layer118 are dissolved. Thus, the unexposed regions 118 a are formed on thematerial layer 112.

Afterwards, the material layer 112 is etched by an etching process 178as shown in FIG. 6F in accordance with some embodiments of thedisclosure. The material layer 112 is etched by using the photoresistlayer 118 as the second layer mask 180 and using the material layer 114as the first layer mask 170.

Next, as shown in FIG. 6G, after the material layer 112 is etched, theunexposed region 118 a of the photoresist layer 118 and the unetchedmaterial layer 114 a are removed, and then the metrology target 104 a isformed. As described above, the first layer mask 170 and the secondlayer mask 180 are used in successive patterning steps, and the firstlayer mask 170 is used in a previous patterning step and the secondlayer mask 180 is used in a subsequent patterning step.

In the metrology target 104 a of FIG. 6G, the photonic crystals 210 and220 are formed of the same material (e.g., the material of the materiallayer 112), such as Si, SiN, Cu, or High K material. The photoniccrystals 210 are formed by the material layer 112 covered by theunetched material layer 114 a, and the photonic crystals 220 are formedby the material layer 112 covered by the unexposed region 118 a of thephotoresist layer 118. Thus, bottoms of the photonic crystals 210 arelevel with that of the photonic crystals 220, and tops of the photoniccrystals 210 are level with that of the photonic crystals 220. In suchembodiments, the photonic crystals 210 and 220 have the same height.Furthermore, the first pattern PAT1 formed by the photonic crystals 210is formed on the substrate 110 according to the first layer mask 170,and the second pattern PAT2 formed by the photonic crystals 220 isformed on the substrate 110 according to the second layer mask 180.

FIGS. 7A-7E show cross-sectional representations of various stages offorming the metrology target 104 a of FIG. 3A, in accordance with someembodiments of the disclosure.

Referring to FIG. 7A, a substrate 110 is provided. Afterwards, amaterial layer 112 is formed on the substrate 110. The material layer112 is designed to form the first pattern PAT1 and the second patternPAT2 of the metrology target 104 a. In some embodiments, the materiallayer 112 is a dielectric layer. In some embodiments, the material layer112 is a metal layer. In order to form the specific patterns, a firstphotolithography process is performed. The first photolithographyprocess includes photoresist coating (e.g., spin-on coating), softbaking, layer mask aligning, exposure, post-exposure baking, developingthe photoresist, rinsing, drying (e.g., hard baking), or other suitableprocesses.

After forming the material layer 112, a photoresist layer 120 is formedon the material layer 112. In some embodiments, the photoresist layer120 is formed by depositing a polymer composition on the material layer112. In some embodiments, the photoresist layer 120 is a positivephotoresist. The positive photoresist is sensitized when exposed tolight so that exposed regions will dissolve in a developer solutionleaving behind unexposed regions.

In some embodiments, the material layer 112 and the photoresist layer120 are independently formed by a deposition process, such as a spin-oncoating process, chemical vapor deposition process (CVD), physical vapordeposition (PVD) process, and/or other suitable deposition processes.

A first layer mask 170 is formed over the photoresist layer 120, and anexposure process 172 is performed on the photoresist layer 120. Forexample, the photoresist layer 120 is exposed to a radiation beamthrough the first layer mask 170. The first layer mask 170 includesblocking portions that do not allow the radiation beam to pass through.

Next, as shown in FIG. 7B, the pattern of the first layer mask 170 istransferred to the photoresist layer 120. Therefore, the photoresistlayer 120 is patterned, and the exposed regions of the photoresist layer120 are dissolved. Thus, the unexposed regions 120 a are formed on thematerial layer 112.

After the exposed regions of the photoresist layer 120 is dissolved, theunexposed regions 120 a of the photoresist layer 120 are baked by aheat. The function of baking is to decompose the photoreactive polymerin the photoresist layer 120 and to evaporate solvent. In someembodiments, a post exposure bake (PEB) operation is performed on theunexposed regions 120 a of the photoresist layer 120.

Referring to FIG. 7C, a photoresist layer 122 is formed on the materiallayer 112, and a second photolithography process is performed. Forexample, the photoresist layer 122 is exposed to a radiation beamthrough a second layer mask 180. The second layer mask 180 includesblocking portions that do not allow the radiation beam to pass through.

Next, as shown in FIG. 7D, the pattern of the second layer mask 180 istransferred to the photoresist layer 122. Therefore, the photoresistlayer 122 is patterned, and the exposed regions of the photoresist layer122 are dissolved. Thus, the unexposed regions 122 a are formed on thematerial layer 112.

Afterwards, the material layer 112 is etched by an etching process asshown in FIG. 7E in accordance with some embodiments of the disclosure.The material layer 112 is etched by using the photoresist layer 122 asthe second layer mask 180 and using the photoresist layer 120 as thefirst layer mask 170. After the material layer 112 is etched, theunexposed region 120 a of the photoresist layer 120 and the unexposedregion 122 a of the photoresist layer 122 are removed, and then themetrology target 104 a is formed.

In the metrology target 104 a of FIG. 7E, the photonic crystals 210 and220 are formed of the same material (e.g., the material of the materiallayer 112). The photonic crystals 210 are formed by the material layer112 covered by the unexposed region 120 a of the photoresist layer 120,and the photonic crystals 220 are formed by the material layer 112covered by the unexposed region 122 a of the photoresist layer 122.Thus, bottoms of the photonic crystals 210 are level with that of thephotonic crystals 220. Furthermore, the first pattern PAT1 formed by thephotonic crystals 210 is formed on the substrate 110 according to thefirst layer mask 170, and the second pattern PAT2 formed by the photoniccrystals 220 is formed on the substrate 110 according to the secondlayer mask 180.

In some embodiments, the photonic crystals 210 and 220 are air pillarsby etched air holes in the material layer 112. For example, by using theunetched material layer 114 a and the unexposed region 118 a to coverthe material layer 112 according to the layer masks complement to thefirst and second layer masks, and then the material layer 112 is etchedto form the air pillars of the photonic crystals 210 and 220.

FIG. 8A shows a schematic illustrating the input light LI, the reflectedlight LR, and the transmitted light LT of a metrology target 104 a_1with overlay-shift. As described above, the input light LI has a centerwavelength F0 with a FWHM_I (as shown in FIG. 5A) is provided to themetrology target 104 a_1 by the optical device 102 of FIG. 1. The firstpattern PAT1 and the second pattern PAT2 can reflect the light with aspecific wavelength, and then the reflected light LR is obtained by thelight detection device 105B. Simultaneously, the light without thespecific wavelength can penetrate the first pattern PAT1 and the secondpattern PAT2, and then the transmitted light LT is obtained by the lightdetection device 105A.

In the metrology target 104 a_1 of FIG. 8A, the photonic crystals 210 ofthe first pattern PAT1 are arranged in an array with the same pitch P,and the photonic crystals 220 of the second pattern PAT2 are alsoarranged in an array with the same pitch P. However, the distances P1between the rightmost photonic crystal 210 of the first pattern PAT1 andthe leftmost photonic crystal 220 of the first pattern PAT2 are largerthan the pitch P (e.g., P1>P). Thus, an alignment error of the firstpattern PAT1 and the second pattern PAT2 is present in the X direction,i.e., the overlay-shift is larger than zero (e.g., OVL>0), and thealignment error of the first and second patterns is caused by amisalignment between the first and second layer masks.

FIG. 8B shows an optical spectrum of the reflected light LR of FIG. 8A.In some embodiments, the information regarding the optical spectrum ofthe reflected light LR is obtained by the light detection device 105B.In FIG. 8B, the reflected light LR has a center wavelength F1, where F1is smaller than F0 (e.g., F1<F0). Ideally, if no alignment error of thefirst pattern PAT1 and the second pattern PAT2 exists, the centerwavelength of the reflected light LR is F0. In the metrology target 104a_1, the alignment error of the first pattern PAT1 and the secondpattern PAT2 is present due to the distances P1 being greater than thepitch P. Thus, the light with the center wavelength F1 is reflected bythe photonic crystals 210 and 220 of the metrology target 104 a_1 due tothe alignment error of the first pattern PAT1 and the second patternPAT2. Specifically, the center wavelength of the reflected light LR ischanged from F0 to F1, i.e., a center wavelength shift occurs. Accordingto the center wavelength F1 of the reflected light LR, the processor 106can determine that the overlay-shift between the photonic crystals 210of the first pattern PAT1 and the photonic crystals 220 of the secondpattern PAT2 is present.

FIG. 8C shows an optical spectrum of the transmitted light LT of FIG.8A. In some embodiments, the information regarding the optical spectrumof the transmitted light LT is obtained by the light detection device105A. In FIG. 8C, the transmitted light LT does not include the lightwith the center wavelength F1. Ideally, if no alignment error of thefirst pattern PAT1 and the second pattern PAT2 exists, the transmittedlight LT does not include the light with the center wavelength F0. Inthe metrology target 104 a_1, the alignment error of the first patternPAT1 and the second pattern PAT2 is present due to the distances P1being greater than the pitch P. Thus, the light without the wavelengthF1 can penetrate the first pattern PAT1 and the second pattern PAT ofthe metrology target 104 a_1 due to the alignment error of the firstpattern PAT1 and the second pattern PAT2, i.e., a center wavelengthshift occurs. According to the wavelength F1 of the transmitted lightLT, the processor 106 can determine that the overlay-shift between thephotonic crystals 210 of the first pattern PAT1 and the photoniccrystals 220 of the second pattern PAT2 is present.

FIG. 9A shows a schematic illustrating the input light LI, the reflectedlight LR, and the transmitted light LT of a metrology target 104 a_2with overlay-shift. As described above, the input light LI has a centerwavelength F0 with a FWHM_I (as shown in FIG. 5A) is provided to themetrology target 104 a_2 by the optical device 102 of FIG. 1. The firstpattern PAT1 and the second pattern PAT2 can reflect the light with aspecific wavelength, and then the reflected light LR is obtained by thelight detection device 105B. Simultaneously, the light without thespecific wavelength can penetrate the first pattern PAT1 and the secondpattern PAT2, and then the transmitted light LT is obtained by the lightdetection device 105A.

In the metrology target 104 a_2 of FIG. 9A, the photonic crystals 210 ofthe first pattern PAT1 are arranged in an array with the same pitch P,and the photonic crystals 220 of the second pattern PAT2 are alsoarranged in an array with the same pitch P. However, the distances P2between the rightmost photonic crystal 210 of the first pattern PAT1 andthe leftmost photonic crystal 220 of the first pattern PAT2 are smallerthan the pitch P (e.g., P2<P). Thus, an alignment error of the firstpattern PAT1 and the second pattern PAT2 is present in the X direction,i.e., the overlay-shift is smaller than zero (e.g., OVL<0), and thealignment error of the first and second patterns is caused by amisalignment between the first and second layer masks.

FIG. 9B shows an optical spectrum of the reflected light LR of FIG. 9A.In some embodiments, the information regarding the optical spectrum ofthe reflected light LR is obtained by the light detection device 105B.In FIG. 9B, the reflected light LR has a center wavelength F2, where F2is larger than F0 (e.g., F2>F0). Ideally, if no alignment error of thefirst pattern PAT1 and the second pattern PAT2 exists, the centerwavelength of the reflected light LR is F0. In the metrology target 104a_2, the alignment error of the first pattern PAT1 and the secondpattern PAT2 is present due to the distances P2 being smaller than thepitch P. Thus, light with the center wavelength F2 is reflected by thephotonic crystals 210 and 220 of the metrology target 104 a_2 due to thealignment error of the first pattern PAT1 and the second pattern PAT2.Specifically, the center wavelength of the reflected light LR is changedfrom F0 to F2, i.e., a center wavelength shift occurs. According to thecenter wavelength F2 of the reflected light LR, the processor 106 candetermine that the overlay-shift between the photonic crystals 210 ofthe first pattern PAT1 and the photonic crystals 220 of the secondpattern PAT2 is present.

FIG. 9C shows an optical spectrum of the transmitted light LT of FIG.9A. In some embodiments, the information regarding the optical spectrumof the transmitted light LT is obtained by the light detection device105A. In FIG. 9C, the transmitted light LT does not include the lightwith the center wavelength F2. Ideally, if no alignment error of thefirst pattern PAT1 and the second pattern PAT2 exists, the transmittedlight LT does not include the light with the center wavelength F0. Inthe metrology target 104 a_2, the alignment error of the first patternPAT1 and the second pattern PAT2 is present due to the distances P2being smaller than the pitch P. Thus, the light without the wavelengthF1 can penetrate the first pattern PAT1 and the second pattern PAT ofthe metrology target 104 a_2 due to the alignment error of the firstpattern PAT1 and the second pattern PAT2, i.e., a center wavelengthshift occurs. According to the wavelength F2 of the transmitted lightLT, the processor 106 can determine that the overlay-shift between thephotonic crystals 210 of the first pattern PAT1 and the photoniccrystals 220 of the second pattern PAT2 is present.

FIG. 10 shows a schematic illustrating the input light LI, and thetransmitted light LT of a metrology target 104 a_3 with overlay-shift.As described above, the input light LI has a center wavelength F0 with aFWHM_I (as shown in FIG. 5A) is provided to the metrology target 104 a_3by the optical device 102 of FIG. 1. In the metrology target 104 a_3 ofFIG. 10, the photonic crystals 210 of the first pattern PAT1 arearranged in an array with the same pitch P, and the photonic crystals220 of the second pattern PAT2 are also arranged in an array with thesame pitch P. However, the distances P2 between the rightmost photoniccrystal 210 of the first pattern PAT1 and the leftmost photonic crystal220 of the first pattern PAT2 are smaller than the pitch P (e.g., P2<P)in the sixth row. Furthermore, the distances P1 between the rightmostphotonic crystal 210 of the first pattern PAT1 and the leftmost photoniccrystal 220 of the first pattern PAT2 are larger than the pitch P (e.g.,P1<P) in the first row. Specifically, the second pattern PAT2 is tilted,and the transmitted light LT with a scattering angel θ is received bythe light detection device 105A. Thus, an alignment error of the firstpattern PAT1 and the second pattern PAT2 is present, i.e., theoverlay-shift is not equal to zero (e.g., OVL≠0), and the alignmenterror of the first and second patterns is caused by a misalignmentbetween the first and second layer masks.

FIG. 11A shows an optical spectrum of a reflected light LR with adecreased center wavelength intensity. As described above, the inputlight LI has a center wavelength F0 with a FWHM_I (as shown in FIG. 5A)is provided to a metrology target (not shown) by the optical device 102of FIG. 1. Furthermore, the information regarding the optical spectrumof the reflected light LR is obtained by the light detection device105B. In FIG. 11A, the reflected light LR has a center wavelength F0,thus no center wavelength shift exists between the reflected light LRand the input light LI. However, compared with the optical spectrum ofthe reflected light LR of FIG. 5B, the maximum amplitude Amp3 of FIG.11A is smaller than the maximum amplitude Amp2, thereby the processor106 can determine that the center wavelength intensity of the reflectedlight LR is decreased in FIG. 11A. Specifically, according to the changein the center wavelength intensity of the reflected light LR, theprocessor 106 can determine whether the alignment error of the firstpattern PAT1 and the second pattern PAT2 is present (e.g., OVL≠0).

FIG. 11B shows an optical spectrum of a reflected light LR with anincreased FWHM. As described above, the input light LI has a centerwavelength F0 with a FWHM_I (as shown in FIG. 5A) is provided to ametrology target (not shown) by the optical device 102 of FIG. 1.Furthermore, the information regarding the optical spectrum of thereflected light LR is obtained by the light detection device 105B. InFIG. 11B, the reflected light LR has a center wavelength F0, thus nocenter wavelength shift exists between the reflected light LR and theinput light LI. Furthermore, the maximum amplitude of the reflectedlight LR is about Amp2, thereby no change in the center wavelengthintensity. However, compared with the optical spectrum of the reflectedlight LR of FIG. 5B, the FWHM FWHM_E of the reflected light LR of FIG.11B is greater than the FWHM FWHM_R of the reflected light LR of FIG.5B, thereby the processor 106 can determine that the FWHM of thereflected light LR is changed in FIG. 11B. Specifically, according tothe change in the FWHM of the reflected light LR, the processor 106 candetermine whether the alignment error of the first pattern PAT1 and thesecond pattern PAT2 is present (e.g., OVL≠0).

FIG. 11C shows an optical spectrum of a reflected light LR with multiplescattering wavelength. As described above, the input light LI has acenter wavelength F0 with a FWHM_I (as shown in FIG. 5A) is provided toa metrology target (not shown) by the optical device 102 of FIG. 1.Furthermore, the information regarding the optical spectrum of thereflected light LR is obtained by the light detection device 105B. InFIG. 11C, the reflected light LR has a center wavelength F0, thus nocenter wavelength shift exists between the reflected light LR and theinput light LI. Furthermore, the maximum amplitude of the reflectedlight LR is about Amp2, thereby no change in the center wavelengthintensity. Moreover, the FWHM of the reflected light LR of FIG. 11C isabout FWHM_R, thereby no change in the FWHM. However, compared with theoptical spectrum of the reflected light LR of FIG. 5B, the reflectedlight LR further has the center wavelengths F1 and F2, thereby theprocessor 106 can determine that the scattering wavelength count isincreased in FIG. 11C. Specifically, according to the change in thescattering wavelength count of the reflected light LR, the processor 106can determine whether an alignment error of the first pattern PAT1 andthe second pattern PAT2 is present (e.g., OVL≠0).

FIGS. 12A-12G show top views of various metrology targets, in accordancewith some embodiments of the disclosure. The types of the metrologytargets include crisscross-type, cluster-type, and combo-type for thephotonic crystalline structures.

In the crisscross-type photonic crystalline structure, the first patternPAT1 and the second pattern PAT2 are arranged to cross in one directionor multi-directions, or to crisscross with each other.

In the cluster-type photonic crystalline structure, the first patternPAT1 and the second pattern PAT2 are arranged in different sides for themetrology target.

In the combo-type photonic crystalline structure, the first pattern PAT1and the second pattern PAT2 are arranged according to the combination ofthe cluster-type and the crisscross-type.

Referring to FIG. 12A, a top view of a metrology target 104 b is shown.The metrology target 104 b is a crisscross-type or combo-type photoniccrystalline structure, and includes a first pattern PAT1 formed bymultiple photonic crystals 210 and a second pattern PAT2 formed bymultiple photonic crystals 220. The first pattern PAT1 is divided intothe first sub-patterns PAT1_1 through PAT1_3, and the second patternPAT2 is divided into the second sub-patterns PAT2_1 through PAT2_3.

The number of photonic crystals 220 of each of the second sub-patternsPAT2_1 through PAT2_3 is equal to the number of photonic crystals 210 ofeach of the first sub-patterns PAT1_1 through PAT1_3. The firstsub-patterns PAT1_1 through PAT1_3 and the second sub-patterns PAT2_1through PAT2_3 are interlaced and parallel to a Y direction. Forexample, in the metrology target 104 b, the photonic crystals 210 of thefirst sub-pattern PAT1_1 are arranged in a first column, the photoniccrystals 220 of the second sub-patterns PAT2_1 are arranged in a secondcolumn, the photonic crystals 210 of the second sub-patterns PAT1_2 arearranged in a third column, the photonic crystals 220 of the secondsub-patterns PAT2_2 are arranged in a fourth column, the photoniccrystals 210 of the second sub-patterns PAT1_3 are arranged in a fifthcolumn, and the photonic crystals 220 of the second sub-patterns PAT2_3are arranged in a sixth column. Thus, the first sub-pattern may besurrounded by the two adjacent second sub-patterns, and the secondsub-pattern may be surrounded by the two adjacent first sub-patterns.For example, the first sub-pattern PAT1_2 is surrounded by the twoadjacent second sub-patterns PAT2_1 and PAT2_2, and the secondsub-pattern PAT2_2 is surrounded by the two adjacent first sub-patternsPAT1_2 and PAT1_3.

Referring to FIG. 12B, a top view of a metrology target 104 c is shown.The metrology target 104 c is a crisscross-type photonic crystallinestructure, and includes a first pattern PAT1 formed by multiple photoniccrystals 210 and a second pattern PAT2 formed by multiple photoniccrystals 220. The first pattern PAT1 is divided into the firstsub-patterns PAT1_1 through PAT1_5, and the second pattern PAT2 isdivided into the second sub-patterns PAT2_1 through PAT2_5. The firstsub-patterns PAT1_1 through PAT1_3 and the second sub-patterns PAT2_1through PAT2_3 are interlaced and parallel to 45 degrees. Thus, thefirst sub-pattern may be surrounded by the two adjacent secondsub-patterns, and the second sub-pattern may be surrounded by the twoadjacent first sub-patterns. For example, the first sub-pattern PAT1_3is surrounded by the two adjacent second sub-patterns PAT2_2 and PAT2_3,and the second sub-pattern PAT2_3 is surrounded by the two adjacentfirst sub-patterns PAT1_3 and PAT1_4. Furthermore, each photonic crystal210 of the first pattern PAT1 is surrounded by photonic crystals 220 ofthe second pattern PAT2, and each photonic crystal 220 of the secondpattern PAT2 is surrounded by photonic crystals 210 of the secondpattern PAT1.

Referring to FIG. 12C, a top view of a metrology target 104 d is shown.The metrology target 104 d is a cluster-type photonic crystallinestructure, and includes a first pattern PAT1 formed by multiple photoniccrystals 210 and a second pattern PAT2 formed by multiple photoniccrystals 220. The first pattern PAT1 is divided into the firstsub-patterns PAT1_1 and PAT1_2, and the second pattern PAT2 is dividedinto the second sub-patterns PAT2_1 and PAT2_2. The first sub-patternsPAT1_1 and PAT1_2 and the second sub-patterns PAT2_1 and PAT2_2 arearranged at different sides of the metrology target 104 d. For example,the first sub-patterns PAT1_1 and PAT1_2 are arranged at the top leftside and the bottom right side of the metrology target 104 d,respectively. Furthermore, the second sub-patterns PAT2_1 and PAT2_2 arearranged at the bottom left side and the top right side of the metrologytarget 104 d, respectively.

Referring to FIG. 12D, a top view of a metrology target 104 e is shown.The metrology target 104 d is a cluster-type photonic crystallinestructure, and includes a first pattern PAT1 formed by multiple photoniccrystals 210 and a second pattern PAT2 formed by multiple photoniccrystals 220. The first pattern PAT1 and the second pattern PAT2 arearranged at the bottom left side and the top right side of the metrologytarget 104 e, respectively.

Referring to FIG. 12E, a top view of a metrology target 104 f is shown.The metrology target 104 f is a combo-type photonic crystallinestructure, and includes a first pattern PAT1 formed by multiple photoniccrystals 210 and a second pattern PAT2 formed by multiple photoniccrystals 220. The first pattern PAT1 is divided into the firstsub-patterns PAT1_1 and PAT1_2, and the second pattern PAT2 is dividedinto the second sub-patterns PAT2_1 and PAT2_2. The number of photoniccrystals 220 of each of the second sub-patterns PAT2_1 and PAT2_2 isgreater than the number of photonic crystals 210 of each of the firstsub-patterns PAT1_1 and PAT1_2. For example, the photonic crystals 210of each of the first sub-patterns PAT1_1 and PAT1_2 are arranged in asingle column, and the photonic crystals 220 of each of the secondsub-patterns PAT2_1 and PAT2_2 are arranged in dual columns. The firstsub-patterns PAT1_1 and PAT1_2 and the second sub-patterns PAT2_1 andPAT2_2 are interlaced and parallel to a Y direction. For example, in themetrology target 104 f, the photonic crystals 210 of the firstsub-pattern PAT1_1 are arranged in the first column, the photoniccrystals 220 of the second sub-patterns PAT2_1 are arranged in thesecond and third columns, the photonic crystals 210 of the secondsub-patterns PAT1_2 are arranged in the fourth column, and the photoniccrystals 220 of the second sub-patterns PAT2_2 are arranged in the fifthand sixth columns. Thus, the first sub-pattern may be surrounded by thetwo adjacent second sub-patterns, and the second sub-pattern may besurrounded by the two adjacent first sub-patterns. For example, thefirst sub-pattern PAT1_2 is surrounded by the two adjacent secondsub-patterns PAT2_1 and PAT2_2, and the second sub-pattern PAT2_1 issurrounded by the two adjacent first sub-patterns PAT1_1 and PAT1_2.

Referring to FIG. 12F, a top view of a metrology target 104 g is shown.The metrology target 104 g is a combo-type photonic crystallinestructure, and includes a first pattern PAT1 formed by multiple photoniccrystals 210 and a second pattern PAT2 formed by multiple photoniccrystals 220. The first pattern PAT1 is divided into the firstsub-patterns PAT1_1 and PAT1_2, and the second pattern PAT2 is dividedinto the second sub-patterns PAT2_1 and PAT2_2. The number of photoniccrystals 210 of each of the first sub-patterns PAT1_1 and PAT1_2 isgreater than the number of photonic crystals 220 of each of the secondsub-patterns PAT2_1 and PAT2_2. For example, the photonic crystals 210of each of the first sub-patterns PAT1_1 and PAT1_2 are arranged in dualrows, and the photonic crystals 220 of each of the second sub-patternsPAT2_1 and PAT2_2 are arranged in single row. The first sub-patternsPAT1_1 and PAT1_2 and the second sub-patterns PAT2_1 and PAT2_2 areinterlaced and parallel to an X direction. For example, in the metrologytarget 104 g, the photonic crystals 210 of the first sub-pattern PAT1_1are arranged in the first and second rows, the photonic crystals 220 ofthe second sub-patterns PAT2_1 are arranged in the third row, thephotonic crystals 210 of the second sub-patterns PAT1_2 are arranged inthe fourth and fifth rows, and the photonic crystals 220 of the secondsub-patterns PAT2_2 are arranged in the sixth row. Thus, the firstsub-pattern may be surrounded by the two adjacent second sub-patterns,and the second sub-pattern may be surrounded by the two adjacent firstsub-patterns. For example, the first sub-pattern PAT1_2 is surrounded bythe two adjacent second sub-patterns PAT2_1 and PAT2_2, and the secondsub-pattern PAT2_1 is surrounded by the two adjacent first sub-patternsPAT1_1 and PAT1_2.

Referring to FIG. 12G, a top view of a metrology target 104 h is shown.The metrology target 104 h is a crisscross-type photonic crystallinestructure, and includes a first pattern PAT1 formed by multiple photoniccrystals 210 and a second pattern PAT2 formed by multiple photoniccrystals 220. The first pattern PAT1 is divided into the firstsub-patterns PAT1_1 through PAT1_3, and the second pattern PAT2 isdivided into the second sub-patterns PAT2_1 and PAT2_2. The photoniccrystals 210 of each of the first sub-patterns PAT1_1 through PAT1_3form the individual rings. The number of photonic crystals 210 of thefirst sub-pattern PAT1_1 is greater than that of the first sub-patternPAT1_2, and the number of photonic crystals 210 of the first sub-patternPAT1_2 is greater than that of the first sub-pattern PAT1_3.Furthermore, the photonic crystals 220 of each of the secondsub-patterns PAT2_1 and PAT2_2 form the individual rings. The number ofphotonic crystals 220 of the second sub-pattern PAT2_1 is greater thanthat of the second sub-pattern PAT2_2. The first sub-pattern may besurrounded by the two adjacent second sub-patterns, and the secondsub-pattern may be surrounded by the two adjacent first sub-patterns.For example, in the metrology target 104 h, the ring formed by thephotonic crystals 220 of the second sub-pattern PAT2_1 is surrounded bythe rings formed by the photonic crystals 210 of the first sub-patternPAT1_1 and PAT1_2. Furthermore, the ring formed by the photonic crystals210 of the first sub-pattern PAT1_2 is surrounded by the rings formed bythe photonic crystals 220 of the second sub-pattern PAT2_1 and PAT2_2.

FIG. 13 shows a top view of a metrology target 104 i, in accordance withsome embodiments of the disclosure. The metrology target 104 i is acluster-type photonic crystalline structure, and includes a firstpattern PAT1 and a second pattern PAT2. The first pattern PAT1 and thesecond pattern PAT2 are formed on a semiconductor structure 110. Thefirst pattern PAT1 is formed by multiple photonic crystals 210 a, andthe photonic crystals 210 a are arranged in an array with the same pitchP. The second pattern PAT2 is formed by multiple photonic crystals 220a, and the photonic crystals 220 a are arranged in an array with thesame pitch P. In the metrology target 104 i, the photonic crystals 210 aand 220 a have the same sectional shape and same size. In suchembodiments, the sectional shape of the photonic crystals 210 a and 220a is a polygon. In such embodiments, each sectional shape of thephotonic crystals 210 a and 220 a is a rectangle or a square shape witha length L. In some embodiments, the pitch P and the length L are about10 nm to 10 μm. In some embodiments, the sectional shape of the photoniccrystals 210 a and 220 a is a hexagon, octagon, decagon, and so on. Insome embodiments, the number of sides of the polygon shape is used todetermine the center wavelength in the reflection light LR. Withdifferent polygon shapes of the same area, the photonic crystals 210 aand 220 a can also produce different depth of focus (DOF) slightly.

FIG. 14 shows a top view of a metrology target 104 j, in accordance withsome embodiments of the disclosure. The metrology target 104 j is acluster-type photonic crystalline structure, and includes a firstpattern PAT1 and a second pattern PAT2. The first pattern PAT1 is formedby multiple photonic crystals 210 b, and the photonic crystals 210 b arearranged in an array with the same pitch P. The second pattern PAT2 isformed by multiple photonic crystals 220 b, and the photonic crystals220 b are arranged in an array with the same pitch P. In the metrologytarget 104 j, the photonic crystals 210 b and 220 b have the samesectional shape and same size. In such embodiments, the sectional shapeof the photonic crystals 210 b and 220 b is an axis-symmetry shape. Insuch embodiments, each sectional shape of the photonic crystals 210 band 220 b is an elliptical shape with a major axis length A and a minoraxis length B, and the major axis length A is larger than the minor axislength B (i.e., A>B). In some embodiments, the sectional shape of thephotonic crystals 210 a and 220 a is a rhombus. In some embodiments, thepitch P, the major axis length A, and the minor axis length B are about10 nm to 10 μm.

FIG. 15A shows a sectional view of a mixed metrology target 204 a, inaccordance with some embodiments of the disclosure. The mixed metrologytarget 204 a is obtained by combining two metrology targets 104 k and1041, and the height of the metrology targets 104 k and 1041 aredifferent. The metrology target 104 k includes the patterns PAT_A1 andPAT_B1 with a first height. The pattern PAT_A1 is formed by multiplephotonic crystals 210 arranged in an array with the same pitch P, andthe pattern PAT_B1 is formed by multiple photonic crystals 220 arrangedin an array with the same pitch. Furthermore, the metrology target 104 lincludes the patterns PAT_A2 and PAT_B2 with a second height, and thefirst height is higher than the second height. The pattern PAT_A2 isformed by multiple photonic crystals 210 arranged in an array with thesame pitch P, and the pattern PAT_B2 is formed by multiple photoniccrystals 220 arranged in an array with the same pitch P. The patternsPAT_A1, PAT_B1, PAT_A2 and PAT_B2 are formed on a semiconductorstructure 110.

FIG. 15B shows a sectional view of the mixed metrology target 204 a ofFIG. 15A along the line B-BB, in accordance with some embodiments of thedisclosure. The photonic crystals 210 and the photonic crystals 220 areformed in the adjacent target layers on the semiconductor structure 110.The bottoms of the photonic crystals 210 are level with those of thephotonic crystals 220. However, the tops of the photonic crystals 210are higher than those of the photonic crystals 220.

FIG. 15C shows a stereoscopic view of the mixed metrology target 204 aof FIG. 15A, in accordance with some embodiments of the disclosure. Thephotonic crystals 210 and 220 are the circular pillars formed of thesame or different materials in the target layers. As described above,the pillars of the photonic crystals 210 are electrically insulated fromeach other, and also electrically insulated from the pillars thephotonic crystals 220.

For measuring the mixed metrology target 204 a, the input light L1 andthe input LI_1 are used. In some embodiments, the optical device 102 orthe stage 107 of FIG. 1 is movable. In some embodiments, the input lightL1 and the input LI_1 are provided by the optical device 102. Forexample, before the optical device 102 provides the input light LI_1,the input light L1 is provided by the optical device 102 and then thereflected light LR and the transmitted light LT corresponding to theinput light L1 are obtained. Next, when the input light L1_1 is providedby the optical device 102, the reflected light LR and the transmittedlight LT corresponding to the input light L1_1 are obtained. In someembodiments, the input light L1 and the input LI_1 are provided bydifferent optical devices.

FIG. 15D shows the Bossung curves 310 and 320 of the mixed metrologytarget 204 a of FIG. 15A, in accordance with some embodiments of thedisclosure. Curve 310 is obtained according to the reflected light LRand the transmitted light LT corresponding to the input light L1_1, andcurve 320 is obtained according to the reflected light LR and thetransmitted light LT corresponding to the input light L1. In general,the Bossung curve is the most commonly applied tool used to analysis thelithographer. The analysis maps a control surface for criticaldimensions (CDs) as a function of the variables of focus and exposure(dose). Most commonly the technique is used to calculate the optimumfocus and dose process point that yields the greatest depth-of-focus(DoF) over a tolerable range of exposure latitude. According to thecurves 310 and 320, the best focus BF of the mixed metrology target 204a is obtained. Furthermore, as the focus moves from the best focus, theCDs of the curves 310 and 320 also change. By using the photoniccrystals 210 and 220 with different heights, the DoF of the mixedmetrology target 204 a is measured and analyzed.

FIG. 16A shows a sectional view of a mixed metrology target 204 b, inaccordance with some embodiments of the disclosure. The mixed metrologytarget 204 b is obtained by combining four metrology targets 104 i ofFIG. 13, 104 j of FIGS. 14, 104 a_4 and 104 a_5, and the heights of themetrology targets four metrology targets are identical. The metrologytargets 104 a_4 and 104 a_5 are the variations of the metrology target104 a of FIG. 2. For example, the metrology targets 104 a_4 and 104 a_5are obtained by rotating the metrology target 104 a of FIG. 2 clockwiseby 90 degrees and adjusting the radius R of the circular shape. In suchembodiments, the radius R of photonic crystals 210 and 220 in themetrology target 104 a_5 is larger than the radius R of photoniccrystals 210 and 220 in the metrology target 104 a_4.

FIG. 16B illustrates the relationship between diffraction intensity (I)and DoF/CD of the mixed metrology target 204 b of FIG. 16A, inaccordance with some embodiments of the disclosure. By using differentmetrology targets with different lengths, the DoF or CD curve can becalculated by multiple points, e.g., 4 points, of the equationY=aX²+bX+c. In some embodiments, the parameters a, b and c are unknown,and the DoF or CD curve can be calculated by at least 3 points (e.g.,the points 410, 420, 430 or 440) to obtain the parameters a, b and c. Insuch embodiments, the point 410 is obtained according to the transmittedlight LT and/or the reflected light LR corresponding to the metrologytarget 104 i, and the point 420 is obtained according to the transmittedlight LT and/or the reflected light LR corresponding to the metrologytarget 104 a_4. Furthermore, the point 430 is obtained according to thetransmitted light LT and/or the reflected light LR corresponding to themetrology target 104 a_5, and the point 440 is obtained according to thetransmitted light LT and/or the reflected light LR corresponding to themetrology target 104 j.

FIG. 17A illustrates the relationship between the differential ofdiffraction intensity (I) and CD (e.g., dI/dCD) of the metrology targets104 a_4 and 104 a_5 of FIG. 16A, in accordance with some embodiments ofthe disclosure. As described above, the metrology targets 104 a_4 and104 a_5 of FIG. 16A have the same patterns and different radius R forthe photonic crystals 210 and 220. In the curve 500, the point 510represents DIFF1/DIFF2 (e.g., DIFF1 is divided by DIFF2) under thetransmitted light LT with a first energy, and the point 520 representsDIFF1/DIFF2 under the transmitted light LT with a second energy higherthan the first energy. DIFF1 represents differential diffractionintensity (I) to CD (e.g., dI/dCD) corresponding to the metrology target104 a_4, and DIFF2 represents differential diffraction intensity to CDcorresponding to the metrology target 104 a_5. According to the points510 and 520, the relationship between CD and the intensity differentialcan be found, as shown in FIG. 17B.

Referring to FIG. 17B, the linear line 530 and the linear line 540 areobtained according to the points 510 and 520 of FIG. 0.17A,respectively. The linear line 530 is from the point 531 corresponding tothe metrology target 104 a_4 to the point 532 corresponding to themetrology target 104 a_5, and the CD value corresponding to the point531 is greater than the CD value corresponding to the point 532.Furthermore, the linear line 540 is from the point 541 corresponding tothe metrology target 104 a_4 to the point 542 corresponding to themetrology target 104 a_5, and the CD value corresponding to the point541 is greater than the CD value corresponding to the point 542.According to the high accuracy linear area (e.g., the linear lines 530and 540), the curve 550 is obtained. By analyzing the characteristics ofthe curve 550, the processor 106 can determine whether CD meets thedesign specifications.

FIG. 18 shows a schematic illustrating a mixed metrology target 204 c,in accordance with some embodiments of the disclosure. The mixedmetrology target 204 c is obtained by combining four metrology targets104_A1, 104_A2, 104_B1, and 104_B2. The metrology targets 104_A1 and104_A2 are used to measure overlay-shift between the photonic crystalscorresponding to the first and second layer masks, and the metrologytargets 104_B1 and 104_B2 are used to measure overlay-shift between thephotonic crystals corresponding to the second and third layer masks orcorresponding to the first and third layer masks. The first, second andthird layer masks are used in successive patterning steps to form thefeatures in different layers in the semiconductor structure 103. Forexample, the first layer mask is used to form MDs in the semiconductorstructure 103, the second layer mask is used to form polys in thesemiconductor structure 103, and the third layer mask is used to formODs in the semiconductor structure 103. Furthermore, the third layermask corresponding to ODs is used in a patterning step prior to thepatterning step that forms the polys, and the second layer maskcorresponding to polys is used in a patterning step prior to thepatterning step that forms the MDs. In such embodiments, the metrologytargets 104_A1 and 104_A2 are used to measure overlay-shift between thephotonic crystals corresponding to the MD mask and the poly mask, andthe metrology targets 104_B1 and 104_B2 are used to measureoverlay-shift between the photonic crystals corresponding to the MD maskand the OD mask. In some embodiments, only the X direction overlay-shiftis considered between the MD and poly layers, and only the Y directionoverlay-shift is considered between the MD and OD layers. Specifically,the overlay-shifts between the first, second, and third layer masks aremeasurable through the mixed metrology target 204 c.

FIG. 19 shows a schematic illustrating of a compound metrology target304, in accordance with some embodiments of the disclosure. The compoundmetrology target 304 is obtained by combining three metrology targets104_C, 104_D, and 104_E, and the mixed metrology target 204 c of FIG.18. By combining various metrology targets 104 and the mixed metrologytargets 204, the overlay-shifts between the various masks (e.g., morethan three masks) are measurable through the compound metrology target304 for multi-layer overlay-shift measurement.

FIG. 20A shows a stereoscopic view of a semiconductor structure 103Awithout overlay-shift, in accordance with some embodiments of thedisclosure. The semiconductor structure 103A includes a semiconductorstructure 110 and a stacked structure 230 on the semiconductor structure110. The stacked structure 230 is formed by stacking the metrologytargets 104 c_1 through 104 c_6. The metrology targets 104 c_1 through104 c_6 are crisscross-type photonic crystalline structures, andarrangements of the photonic crystals 210 and 220 of the metrologytargets 104 c_1 through 104 c_6 are similar to the metrology targets 104c of FIG. 12B. For the convenience of explanation, the photonic crystals210 and 220 are represented by squares. Furthermore, the features andmaterial other than the photonic crystals 210 and 220 are omitted fromthe semiconductor structure 103A.

In such embodiments, the metrology target 104 c_1 is formed in amaterial layer L1 on the substrate 110. The photonic crystals 210 and220 of the metrology target 104 c_1 are formed according to a firstlayer mask corresponding to the material layer L1 and a second layermask corresponding to a material layer L2.

The metrology target 104 c_2 is formed in the material layer L2 on thematerial layer L1. The photonic crystals 210 and 220 of the metrologytarget 104 c_2 are formed according to the second layer maskcorresponding to the material layer L2 and a third layer maskcorresponding to a material layer L2.

The metrology target 104 c_3 is formed in the material layer L3 on thematerial layer L2. The photonic crystals 210 and 220 of the metrologytarget 104 c_3 are formed according to the third layer maskcorresponding to the material layer L3 and a fourth layer maskcorresponding to a material layer L4.

The metrology target 104 c_4 is formed in the material layer L4 on thematerial layer L3. The photonic crystals 210 and 220 of the metrologytarget 104 c_4 are formed according to the fourth layer maskcorresponding to the material layer L4 and a fifth layer maskcorresponding to a material layer L5.

The metrology target 104 c_5 is formed in the material layer L5 on thematerial layer L4. The photonic crystals 210 and 220 of the metrologytarget 104 c_5 are formed according to the fifth layer maskcorresponding to the material layer L5 and a sixth layer maskcorresponding to a material layer L6.

The metrology target 104 c_6 is formed in the material layer L6 on thematerial layer L5. The photonic crystals 210 and 220 of the metrologytarget 104 c_6 are formed according to the sixth layer maskcorresponding to the material layer L7 and a seventh layer maskcorresponding to a material layer L7 (not shown).

In some embodiments, the overlay-shift from the N^(th) layer mask to thefirst layer mask is obtained according to the overlay-shifts of the twoadjacent layer masks according to the following equation:

OVL_(Nto1)=OVL_(2to1)+OVL_(3to2)+OVL_(4to3) . . . +OVLN_(N-1toN-2).

For example, if N=6, the overlay-shift OVL_(6to1) from the sixth layermask to the first layer mask is obtained by summing the overlay-shiftOVL_(2to1) corresponding to the metrology target 104 c_1, theoverlay-shift OVL_(3to2) corresponding to the metrology target 104 c_2,the overlay-shift OVL_(4to3) corresponding to the metrology target 104c_3, the overlay-shift OVL_(5to4) corresponding to the metrology target104 c_4, and the overlay-shift OVL_(6t05) corresponding to the metrologytarget 104 c_5.

As described above, when the input light LI illuminates the stackedstructure 230, the reflected light LR is obtained. According to theinformation regarding the characteristics of the reflected light LR, theprocessor 106 is capable of determining the overlay-shift between themetrology targets 104 c_1 through 104 c_6 for multi-layer overlay-shiftmeasurement.

FIG. 20B shows a stereoscopic view of a semiconductor structure 103A ofFIG. 20A with an overlay-shift in the fifth material layer L5. Byanalyzing the information regarding the characteristics (e.g., centerwavelength shift, scattering wavelength count, scatter angle, centerwavelength intensity, fill width at half maximum or photonic band gap)of the reflected light LR, the processor 106 can determined that analignment error of the metrology targets 104 c_1 through 104 c_6 ispresent (e.g., OVL≠0). Furthermore, according to the variations of thecharacteristics of the reflected light LR and previous overlay-shiftsimulation results, the processor 106 can further determine whichmaterial layer will have an alignment error.

FIG. 21 shows a method for measuring a metrology target (or alignmentmark) of a semiconductor structure, in accordance with some embodimentsof the disclosure. The method is performed by a shift measurement system(e.g., 100 of FIG. 1). As described above, the metrology target may be asingle metrology target 104, a mixed metrology target 204 or a compoundmetrology target 304 in a semiconductor structure 103. Furthermore, themetrology target includes at least a first pattern PAT1 formed by thephotonic crystals 210 and a second pattern PAT2 formed by the photoniccrystals 220.

In operation S610, an input light LI from an optical device (e.g., 102of FIG. 1) is provided to illuminate the metrology target. In someembodiments, the input light LI is a pulsed or broadband light. In someembodiments, the input light LI horizontally illuminates the metrologytarget (e.g., illuminates the side of the metrology target), so as tohorizontally penetrate the metrology target. In some embodiments, theinput light LI illuminates the surface of metrology target.

In operation S620, in response to the input light LI, the reflectedlight LR reflected by the metrology target and/or the transmitted lightLT transmitted through the metrology target are received.

As described above, if no alignment error of the photonic crystals 210and 220 exists, the characteristics of the reflected light LR and/or thetransmitted light LT are substantially similar to those of the inputlight LI.

In operation S630, the shift measurement system is capable ofdetermining whether an alignment error is present between the firstpattern PAT1 and the second pattern PAT2 according to thecharacteristics of the reflected light LR and/or the transmitted lightLT. In some embodiments, the center wavelength shift, scatteringwavelength count, scatter angle, center wavelength intensity, full widthat half maximum or photonic band gap of the reflected light LR and/orthe transmitted light LT are measured, so as to obtain the overlay-shiftof the metrology target. As described above, by using photonic crystalswith different heights, the depth-of-focus of the semiconductorstructure is obtained according to the characteristics of the reflectedlight LR and/or the transmitted light LT. Moreover, by analyzing thediffraction intensity of the reflected light LR and/or the transmittedlight LT corresponding to various energy of the input light LIassociated with the mixed or compound metrology target, the CD of thesemiconductor structure is obtained.

If it is determined that no alignment error of the photonic crystals 210and 220 exists, i.e., the overlay-shift of the metrology target is zero(e.g., OVL=0), the subsequent processes (e.g., the following patterningsteps) will be performed. Conversely, if it is determined that analignment error of the photonic crystals 210 and 220 exists, i.e., theoverlay-shift of the metrology target is zero (e.g., OVL≠0), thesemiconductor structure 103 will be verified.

Embodiments of the semiconductor structure, overlay-shift measurementsystem, and method for measuring a metrology target (or alignment mark)of semiconductor structure are provided. A metrology target (oralignment mark) is arranged on a substrate of the semiconductorstructure for overlay-shift measurement, and the metrology targetincludes a first pattern PAT1 formed by the photonic crystals 210 and asecond pattern PAT2 formed by the photonic crystals 220. The bottoms ofthe photonic crystals 210 are level with those of the photonic crystals220. In some embodiments, the metrology target is a single metrologytarget, a mixed metrology target, or a compound metrology target. Byadjusting the sectional shapes and sizes of the photonic crystals 210and 220, accuracy of the overlay-shift is increased. Furthermore, byusing the photonic crystals 210 and 220 corresponding to various layermasks, multi-layer overlay-shift measurement is obtained throughmeasuring the metrology target. Moreover, by using the photonic crystalswith different heights, the DoF of the semiconductor structure ismeasured through measuring the metrology target. Furthermore, by usingmultiple metrology targets, CD of the semiconductor structure ismeasured according to the diffraction intensity of the reflected lightLR and/or the transmitted light LT with various energy of the inputlight LI. Thus, manufacturing cost and cycle time are decreased due toCD, DoF and overlay-shift are simultaneously measured through amulti-functional metrology target.

In some embodiments, a method for manufacturing a semiconductorstructure is provided. A substrate is provided. A first lithography isperformed according to a first layer mask, to form a plurality of firstphotonic crystals with a first pitch on a first area of a layer abovethe substrate. A second lithography is performed according to a secondlayer mask, to form a plurality of second photonic crystals with asecond pitch on a second area of the layer. A light is provided toilluminate the first and second photonic crystals. Light reflected bythe first and second photonic crystals or transmitted through the firstand second photonic crystals is received. The received light is analyzedto detect overlay-shift between the first photonic crystalscorresponding to the first layer mask and the second photonic crystalscorresponding to the second layer mask.

In some embodiments, an overlay-shift measurement system is provided.The overlay-shift measurement system includes an optical device, a firstlight detection device, and a processor. The optical device isconfigured to provide an input light to an alignment mark of asemiconductor structure. The first light detection device is configuredto receive a transmitted light from the alignment mark when the inputlight penetrates the alignment mark. The processor is configured todetermine whether an overlay-shift is present in the alignment markaccording to the characteristics of the transmitted light.

In some embodiments, a method for measuring an alignment mark of asemiconductor structure is provided. A pulsed or broadband light isprovided to illuminate the alignment mark of the semiconductorstructure. The alignment mark includes a first pattern formed by aplurality of first photonic crystals with a first pitch, and a secondpattern formed by a plurality of second photonic crystals with a secondpitch. Light reflected by the alignment mark or transmitted through thealignment mark is received. It is determined whether an alignment erroris present between the first and second patterns according to thecharacteristics of the received light. Each of the plurality of firstphotonic crystals is formed by a first pillar with a first materialaccording to a first layer mask, and each of the plurality of secondphotonic crystals is formed by a second pillar with a second materialaccording to a second layer mask. An alignment error of the first andsecond patterns represents a misalignment between the first and secondlayer masks. The first and second layer masks are used in successivepatterning steps, and the first layer mask is used in a previouspatterning step and the second layer mask is used in a subsequentpatterning step.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A method for manufacturing a semiconductorstructure, comprising: providing a substrate; performing a firstlithography according to a first layer mask, to form a plurality offirst photonic crystals with a first pitch on a first area of a layerabove the substrate; performing a second lithography according to asecond layer mask, to form a plurality of second photonic crystals witha second pitch on a second area of the layer; providing a light toilluminate the first and second photonic crystals; receiving lightreflected by the first and second photonic crystals or transmittedthrough the first and second photonic crystals; and analyzing thereceived light to detect overlay-shift between the first photoniccrystals corresponding to the first layer mask and the second photoniccrystals corresponding to the second layer mask.
 2. The method asclaimed in claim 1, further comprising: analyzing the received light toobtain a critical dimension of the semiconductor structure.
 3. Themethod as claimed in claim 1, further comprising: analyzing the receivedlight to obtain depth-of-focus of the semiconductor structure.
 4. Themethod as claimed in claim 1, wherein the first and second photoniccrystals comprise Si, SiN, Cu, or a High K material.
 5. The method asclaimed in claim 1, wherein the first and second photonic crystals arepillars formed by etched air holes in a material of the layer.
 6. Themethod as claimed in claim 1, wherein the first and second photoniccrystals have the same sectional shape, and the first pitch is equal tothe second pitch.
 7. The method as claimed in claim 1, wherein the firstphotonic crystals are divided into a plurality of first groups and thesecond photonic crystals are divided into a plurality of second groups,wherein each of the first groups is surrounded by the two adjacentsecond groups, and each of the second groups is surrounded by the twoadjacent first groups.
 8. The method as claimed in claim 1, wherein thefirst photonic crystals are separated from the second photonic crystals.9. An overlay-shift measurement system, comprising: an optical deviceconfigured to provide an input light to an alignment mark of asemiconductor structure; a first light detection device configured toreceive a transmitted light from the alignment mark when the input lightpenetrates the alignment mark; and a processor configured to determinewhether an overlay-shift is present in the alignment mark according tocharacteristics of the transmitted light.
 10. The overlay-shiftmeasurement system as claimed in claim 9, further comprising: a secondlight detection device configured to receive a reflected light from thealignment mark when the input light illuminates the alignment mark,wherein the processor is configured to determine whether theoverlay-shift is present in the alignment mark according to thecharacteristics of both the transmitted light and the reflected light.11. The overlay-shift measurement system as claimed in claim 9, whereinthe alignment mark comprises a first pattern formed by a plurality offirst photonic crystals with a first pitch, and a second pattern formedby a plurality of second photonic crystals with a second pitch, whereinthe first light detection device is configured to receive thetransmitted light from the first and second patterns when the inputlight penetrates the first and second patterns.
 12. The overlay-shiftmeasurement system as claimed in claim 11, wherein the first and secondphotonic crystals have the same sectional shape, and the first pitch isequal to the second pitch.
 13. The overlay-shift measurement system asclaimed in claim 9, wherein the characteristics of the transmitted lightcomprise information regarding center wavelength shift, scatteringwavelength count, scatter angle, center wavelength intensity, fill widthat half maximum or photonic band gap.
 14. The overlay-shift measurementsystem as claimed in claim 9, wherein the processor is configured toobtain a critical dimension of the semiconductor structure according tothe characteristics of the transmitted light.
 15. The overlay-shiftmeasurement system as claimed in claim 9, wherein the processor isconfigured to obtain depth-of-focus of the semiconductor structureaccording to the characteristics the transmitted light.
 16. A method formeasuring an alignment mark of a semiconductor structure, comprising:providing a pulsed or broadband light to illuminate the alignment markof the semiconductor structure, wherein the alignment mark comprises afirst pattern formed by a plurality of first photonic crystals with afirst pitch, and a second pattern formed by a plurality of secondphotonic crystals with a second pitch; receiving light reflected by thealignment mark or transmitted through the alignment mark; anddetermining whether an alignment error between the first and secondpatterns is present according to characteristics of the received light,wherein each of the plurality of first photonic crystals is formed by afirst pillar with a first material according to a first layer mask, andeach of the plurality of second photonic crystals is formed by a secondpillar with a second material according to a second layer mask, whereinan alignment error of the first and second patterns represents amisalignment between the first and second layer masks, wherein the firstand second layer masks are used in successive patterning steps, and thefirst layer mask is used in a previous patterning step and the secondlayer mask is used in a subsequent patterning step.
 17. The method asclaimed in claim 16, wherein the characteristics of the received lightcomprise information regarding center wavelength shift, scatteringwavelength count, scatter angle, center wavelength intensity, fill widthat half maximum or photonic band gap.
 18. The method as claimed in claim16, further comprising: obtaining a critical dimension of thesemiconductor structure according to the characteristics of the receivedlight.
 19. The method as claimed in claim 16, further comprising:obtaining depth-of-focus of the semiconductor structure according to thecharacteristics of the received light.
 20. The method as claimed inclaim 16, wherein the first pillar is electrically insulated from thesecond pillar.